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Carrier-Selective NiO/Si and TiO2/Si Contacts for Silicon Heterojunction Solar Cells

IEEE Transactions on Electron Devices • 2016
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Publication Information
Authors H. ImranT. M. AbdolkaderH. ImranH. ImranH. Imran; Tarek M. Abdolkader; N. Z. Butt
Keywords Energy barrier Heterojunctions Metals Photonic band gap Photovoltaic cells Silicon Tunneling Carrier-selective contacts Fermi-level pinning (FLP) heterojunction solar cell interfacial oxide barrier quantum tunneling semiclassical approach
Journal IEEE Transactions on Electron Devices
Publisher IEEE
Volume 63
Issue 9
Pages 3584-3590
publication.type International
Paper Link Not Available
Supplementary Materials Not Available
Abstract
Carrier-selective contacts based on thin oxides of nickel and titanium are computationally investigated for heterojunction silicon solar cells. Replacing the standard amorphous/c-Si heterojunction with NiO/c-Si (front) and TiO₂/c-Si (back), we explore the physical requirements to enhance the cell efficiency beyond the physical limits of the conventional structure. Under ideal conditions, a wider bandgap (>3 eV) of these metal oxides provides a high optical transparency, whereas a near-perfect alignment of their energy bands with silicon ensures a high fill factor (FF), which is often difficult to obtain in some of the other wide-bandgap alternatives, e.g., SiOₓ, due to imperfect band offsets that hinder carrier extraction. We explore the practical nonidealities that could possibly degrade cell efficiency below its ideal limit. In particular, effects of interfacial defects, Fermi-level pinning at c-Si/TiO₂/metal contact, variability in the bandgap of NiO, and nonoptimized metal oxide doping density are investigated quantitatively. Using the reported experimental data for these nonideal effects, we highlight that the cell efficiency of ~28% could be achieved under AM1.5 illumination with an optimal cell design. These modeling insights provide useful guidelines for the future development of exploratory window layers for silicon solar cells using NiO (front) and TiO₂ (back) heterojunctions.