Carrier-Selective NiO/Si and TiO2/Si Contacts for Silicon Heterojunction Solar Cells
IEEE Transactions on Electron Devices • 2016
معلومات البحث
المؤلفون
H. ImranT. M. AbdolkaderH. ImranH. ImranH. Imran; Tarek M. Abdolkader; N. Z. Butt
الكلمات المفتاحية
Energy barrier
Heterojunctions
Metals
Photonic band gap
Photovoltaic cells
Silicon
Tunneling
Carrier-selective contacts
Fermi-level pinning (FLP)
heterojunction solar cell
interfacial oxide barrier
quantum tunneling
semiclassical approach
المجلة العلمية
IEEE Transactions on Electron Devices
الناشر
IEEE
المجلد
63
العدد
9
الصفحات
3584-3590
publication.type
International
رابط البحث
Not Available
المواد المرفقة
Not Available
الملخص
Carrier-selective contacts based on thin oxides of nickel and titanium are computationally investigated for heterojunction silicon solar cells. Replacing the standard amorphous/c-Si heterojunction with NiO/c-Si (front) and TiO₂/c-Si (back), we explore the physical requirements to enhance the cell efficiency beyond the physical limits of the conventional structure. Under ideal conditions, a wider bandgap (>3 eV) of these metal oxides provides a high optical transparency, whereas a near-perfect alignment of their energy bands with silicon ensures a high fill factor (FF), which is often difficult to obtain in some of the other wide-bandgap alternatives, e.g., SiOₓ, due to imperfect band offsets that hinder carrier extraction. We explore the practical nonidealities that could possibly degrade cell efficiency below its ideal limit. In particular, effects of interfacial defects, Fermi-level pinning at c-Si/TiO₂/metal contact, variability in the bandgap of NiO, and nonoptimized metal oxide doping density are investigated quantitatively. Using the reported experimental data for these nonideal effects, we highlight that the cell efficiency of ~28% could be achieved under AM1.5 illumination with an optimal cell design. These modeling insights provide useful guidelines for the future development of exploratory window layers for silicon solar cells using NiO (front) and TiO₂ (back) heterojunctions.
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