| publication name | “Reliability aspects. of tunnel oxides under different Fowler—Nordheim stress conditions” Proceeding. of the 1991 International Conference on Microelectronics, Cairo, Egypt, PP. 304—307, Dec. 21—23. |
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| Authors | P. MORFOULI, G. PAPADAS, G. GHIBAUDO, G. PANANAKAKIS and M.T. ELEWA |
| year | 1991 |
| keywords | |
| journal | |
| volume | Not Available |
| issue | Not Available |
| pages | Not Available |
| publisher | Not Available |
| Local/International | Local |
| Paper Link | Not Available |
| Full paper | download |
| Supplementary materials | Not Available |
Abstract
Not Available