| publication name | Ultrahigh-sensitivity graphene-based strain gauge sensor: fabrication on Si/SiO2 and first-principles simulation |
|---|---|
| Authors | M Gamil, A El-Bab, AA El-Moneim, K Nakamura |
| year | 2018 |
| keywords | chemical vapor deposition, strain gauge, gauge factor, piezoresistive sensors, MEMS devices, first-principles calculation |
| journal | Sensors and Materials |
| volume | 30 |
| issue | 9 |
| pages | 2085–2100 |
| publisher | MYU Tokyo |
| Local/International | International |
| Paper Link | https://myukk.org/SM2017/sm_pdf/SM1662.pdf |
| Full paper | download |
| Supplementary materials | Not Available |
Abstract
Monolayer and multilayer graphene films have been grown on a Cu substrate by chemical vapor deposition (CVD) and then transferred onto a SiO2/Si substrate using polymethyl methacrylate (PMMA) to fabricate an ultrasensitive graphene-based strain gauge sensor. The graphene films were patterned using a CO2 laser beam. The sensitivity and temperature dependence of the gauge factor (GF) of the fabricated sensors were examined at different applied strains and operating temperatures up to 0.05% and 75 °C, respectively. The fabricated gauges based on monolayer and multilayer graphene films show stable GFs of 255 and 104 within the applied temperature range, respectively. The patterning technique provides an interesting, low-cost, fast, and high-throughput process to realize scalable microfabrication for highly sensitive strain sensors with good temperature stability based on graphene piezoresistivity. A theoretical simulation of the GF of monolayer graphene has also been carried out on the basis of first-principles calculation. Simulation results follow the measured GFs in our experiment and other references.